Rotatable cathode : CMC-RT
씨앤아이테크놀로지는 국내 최초 Rotatable cathode 양산화에 성공하였습니다. 원통형 타겟을 이용하여 고효율 스퍼터링이 가능합니다.
주요 특징
- Easy to maintenance design with high reliability
- Variable sputtering incident angle : 18˚ ~ 30˚
- Supply customized magnet bar to fit process requirements
- Variable sputtering tilting angle : 0˚ ~ 60˚
- Patented dual magnet design for high efficiency
- Thickness Non-uniformity : < ±5% (@ All layer)
- Target erosion efficiency : ≥ 80%
- Uniformity of RTR : ≤ ±3%